- Characterization of the cleaning and coating homogeneity of wafers
- Adhesion evaluation between wafer and coating
- Wetting investigation of exposed and unexposed photo varnish
- Ideal for analyzing other round samples, e.g. hard drives or brake disks
MEASURING METHODS
- Contact angle of a drop on a solid surface
- Contact angles of two drops dosed in parallel
- Automated position-dependent contact angle measurement and evaluation
- Contact angle using a gas bubble beneath a solid surface in a liquid
- Surface free energy of a solid using contact angle data
- Surface tension using the curvature of a perfectly symmetrical drop on a circular sample pedestal
- Roll-off behavior and advancing/receding contact angle of a drop on a tilted surface
- Carrying out a measurement up to 20 consecutive times and displaying the results together
- Remote control of ADVANCE for integration in custom-designed, complex automations
MEASURING RESULTS
- Static contact angle
- Advancing and receding contact angle
- Contact angle using a bubble in a liquid
- Surface free energy (SFE) according to the following models: Owens-Wendt-Rabel-Kaelble (OWRK), Fowkes, Extended Fowkes, Van Oss & Good (Acid-Base), Schultz, Wu, Zisman, Equation of State
- Position-dependent contact angle and SFE
- Temperature